Today, let’s continue to learn about the Dry Etching Process, in this article we will learn about the ICP-RIE bias.
ICP-RIE etching process generates DC bias and attracts ions to the wafer. Therefore, with ICP RIE technology, it is possible to decouple the ion current and ion energy applied to the wafer, enlarging the process window.
We will learn about the basic rules in ICP-RIE Etching Process.
