First, let's talk about an important component: the coil.
The design of the coil significantly impacts the generation and characteristics of the plasma.
The shape of the coil, whether it is spiral, toroidal, or other shapes, as well as its size, material, and distance from the reaction chamber, can all affect the strength and distribution of the electromagnetic field, thereby affecting the density, uniformity, and ion energy distribution of the plasma.
These factors collectively determine the properties of the plasma, including its etching capability on materials. Some modern ICP-RIE systems may employ multiple coils or complex coil structures to optimize the performance of the plasma, achieving higher etching efficiency and better etching quality
