Lastly, let's explore the main application scenarios of ICP-RIE dry etching:
ICP-RIE technology is widely used for the rapid etching of various materials, including semiconductors, dielectrics, metals, and polymers, due to its ability to provide high etch rates, high selectivity, and low damage processing. The process range of this technology is extensive, from low-damage ICP etching processes to the etching of hard materials. The chemical gases used in the process vary depending on the type of film to be etched; for example, fluorine-based gases are commonly used in dielectric etching applications, while chlorine-based chemicals are used for metal etching.
That concludes our discussion on ICP-RIE dry etching. If you are interested in placing a PCB order with us, please feel free to contact our sales team.
